13.5nm, 25.4mm Dia, 5° AOI, EUV Flat Mirror

Product Details Maximum Achievable Reflection at 13.5nm Designed for EUV Beam Steering and Harmonic Separation 5° and 45° AOI Versions Available Extreme Ultraviolet (EUV) Flat Mirrors are multilayer mirrors designed for maximum achievable reflectance at the design wavelength and angle of incidence. These mirrors feature a coating deposited on a super-polished single crystal silicon substrate and surface roughness less than 3Å RMS. The 45° AOI mirrors are useful for steering s-polarized beams, while the 5° AOI mirrors may be used with unpolarized beams. Applications for EUV mirrors include Coherent Diffractive Imaging (CDI) and materials science research. Extreme Ultraviolet (EUV) Flat Mirrors can also serve as harmonic selectors for High Harmonic Generation (HHG) beams. Note: Test data from each mirror’s production run sample included. Specifications General Type: Flat Mirror Physical & Mechanical Properties Diameter (mm): 25.40 ±0.25 Thickness (mm): 6.35 ±0.508 Clear Aperture (%): 90 Parallelism (arcmin): 3 Edges: Fine Ground Surface Roughness (Å): <5 RMS Back Surface: Commercial Polish Optical Properties Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More Single Crystal Silicon Coating: Mo/Si Multilayer Top Layer: Silicon Coating Type: Metal/Semiconductor Coating Specification: R abs >60% @ 13.5nm, 5° (s-pol) Wavelength Range (nm): 13.18 – 13.68 Design Wavelength DWL (nm): 13.5 Surface Flatness (P-V): λ/10 @ 632.8nm Angle of Incidence (°): 5 Surface Quality: 10-5 Reflection at DWL (%): >60 Full Width-Half Max FWHM (nm): 0.50 Center Energy (eV): 92 Regulatory Compliance Certificate of Conformance: View ×