800nm, 0.80 NA, aplanoXX Aplan Objective | aplanoXX NA0.8_20_800

Product Details Aplanatic Optical Design High Numerical Aperture for Small Spot Sizes Designs for 800 and 1030nm with Focusing Depth Up to 4mm AdlOptica foXXus Multi-Focus Objectives Also Available AdlOptica aplanoXX Aplan Objectives compensate for spherical aberration and coma when focusing into glass, sapphire, silicon carbide, silicon, PMMA, and other transparent materials at depths up to 4mm. These objectives are designed to be used with ultrafast solid-state and fiber lasers and are optimized for 800nm (Ti:sapphire) and 1030nm (Yb:doped). Featuring C-Mount threading and an optical design insensitive to misalignment, these objectives are easy to integrate into laser systems. AdlOptica aplanoXX Aplan Objectives are ideal for micromachining glass, 3D nanofabrication, waveguide recording, and selective laser etching. A collar on the objective allows for manual adjustment of focus and a replaceable front window protects from debris during materials processing. Specifications General Model Number: aplanoXX NA0.8_20_800 Type: Objective Field of View (°): ±0.3 Note: Includes aplanoXX objective, mounted protective window ( #19-496 ), and spanner wrench #19-497 ) Physical & Mechanical Properties Length (mm): 54.10 Clear Aperture CA (mm): 20 Diameter (mm): 44.00 Optical Properties Focal Length FL (mm): 12.50 Numerical Aperture NA: 0.80 Working Distance (mm): 2.5 (1.6 with Protective Window) Design Wavelength DWL (nm): 800 Wavelength Range (nm): 770 – 900 Damage Threshold, By Design: Damage threshold for optical components varies by substrate material and coating. Click here to learn more about this specification. 100 mJ @ 5ns 300 μJ @ 1ps Focusing Depth (mm): 0 – 4 Beam Diameter (mm): 20 (maximum) Threading & Mounting Mount: C-Mount Regulatory Compliance RoHS 2015: Compliant × Certificate of Conformance: View × Reach 250: Compliant ×