13.5nm, 25.4mm Dia, 5° AOI, EUV Spherical Mirror

Product Details Mo/Si Multilayer Coating on Super-Polished Substrates Maximum Achievable Reflection at 13.5nm Designed for EUV Beam Focusing Applications Narrow Pass Band for HHG Applications Extreme Ultraviolet (EUV) Spherical Mirrors feature a multilayer Mo/Si coating providing greater than 60% reflection at 13.5nm. They are designed for a 5° angle of incidence and intended for focusing unpolarized EUV laser sources. A surface roughness of less than 3Å RMS minimizes scatter. This is essential for EUV wavelengths which experience more scattering than longer wavelengths. EUV Spherical Mirrors have a very narrow pass band of approximately 0.5nm, ensuring that only the 13.5nm harmonic of interest is reflected in high harmonic generation (HHG) applications. Typical applications for EUV spherical mirrors include Coherent Diffractive Imaging (CDI), EUV imaging, and EUV nanomachining. Note: Test data from each mirror’s production run sample included. Specifications General Type: Spherical Mirror Physical & Mechanical Properties Diameter (mm): 25.40 +0.00/-0.13 Thickness (mm): 6.35 ±0.25 Surface Roughness (Å): <3 RMS Optical Properties Effective Focal Length EFL (mm): 250.00 Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More Fused Silica (Corning 7980) Coating: Mo/Si Multilayer Top Layer: Silicon Coating Type: Metal/Semiconductor Coating Specification: R abs >60% @ 13.5nm Design Wavelength DWL (nm): 13.5 Surface Flatness (P-V): λ/10 @ 632.8nm Angle of Incidence (°): 5 Radius R 1 (mm): 500.00 Radius of Curvature (mm): 500.00 Full Width-Half Max FWHM (nm): 0.50 Regulatory Compliance Certificate of Conformance: View ×