2000nm, 76.2mm Dia. x 12.7mm Thickness, Ultrafast Laser Mirror

Product Details GDD as Low as ±20fs 2 at Design Wavelength Range Greater than 99.9% Reflectivity Ideal for Ti:sapphire and Yb:doped Ultrafast Lasers TECHSPEC Low GDD Dielectric Ultrafast Laser Mirrors feature a multilayer dielectric coating on fused silica substrates for excellent reflectivity of greater than 99.9%, and low coefficient of thermal expansion, making them ideal for ultrafast beam transport applications. These mirrors have a group delay dispersion (GDD) of near zero at their design wavelength range, minimizing dispersion of the reflected beam. TECHSPEC Low GDD Dielectric Ultrafast Laser Mirrors are ideal for utilizing the first and second harmonic of Ti:sapphire and Yb:doped lasers for applications such as laser machining and welding. Note: Please contact us if your application requires a TECHSPEC Low GDD Ultrafast Mirror with a custom wavelength, angle, or size. Specifications General Type: Laser Mirror Physical & Mechanical Properties Thickness (mm): 6.35 ±0.20 Diameter (mm): 76.20 +0.00/-0.10 Clear Aperture (%): 90 Back Surface: Commercial Polish Parallelism (arcmin): <3 Optical Properties Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More Fused Silica Surface Quality: 10-5 Angle of Incidence (°): 45 Coating: Ultrafast (1900-2100nm) Design Wavelength DWL (nm): 2000 Wavelength Range (nm): 1900 - 2100 Surface Flatness (P-V): λ/8 Coating Specification: R (avg) S & P >99.90% @ 2000nm @ 45° AOI R (avg) >99.7% @ 1900 – 2100nm @ 45° AOI Coating Type: Dielectric GDD Specification: ±40 fs 2 @ 1900 – 2100nm @ 45° AOI (s-pol) ±100 fs 2 @ 1970 – 2030nm @ 45° AOI (p-pol) Environmental & Durability Factors Durability: MIL-PRF-13830B Regulatory Compliance Certificate of Conformance: View ×