25.4mm Dia. Uncoated, Silicon, Laser Mirror

Product Details Silicon Substrate for Thermally Demanding Ultrafast Setups λ/10 Surface Flatness and 40-20 Surface Quality Available In Standard Diameters for Coating Flexibility and System Integration TECHSPEC Silicon Laser Mirror Substrates feature a high-thermal-conductivity silicon substrate designed for thermally demanding high-power and ultrafast laser applications. Optimized for efficient heat distribution in challenging optical setups, these substrates help mitigate thermally induced wavefront distortion. Designed as a coating-ready platform, TECHSPEC Silicon Laser Mirror Substrates provide a flexible foundation for custom broadband or low-dispersion mirror solutions. Available in 12.7mm, 25.4mm, and 50.8mm diameters, these mirrors offer flexibility for integration into a wide range of laser system configurations. Specifications General Type: Laser Mirror Substrate Physical & Mechanical Properties Diameter (mm): 25.40 +0.00/-0.10 Thickness (mm): 6.35 ±0.10 Clear Aperture (%): 90 Parallelism (arcmin): <3 Back Surface: Commercial Polish Optical Properties Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More Optical Grade Silicon Coating: Uncoated Coating Specification: N/A Surface Flatness (P-V): λ/10 Surface Quality: 40-20 Regulatory Compliance Certificate of Conformance: View ×