Coherent LightSmyth 855nm, 200nm Groove Depth, 12.5mm Sq. Linear Silicon Nanostamp

Product Details Nanoscale-Textured Grooved Surfaces Variable Groove Period and Groove Depth Ideal for Nanophotonics Research Applications Coherent LightSmyth Nanopattern Silicon Stamps consist of nanoscale-textured surfaces patterned on single-crystal silicon substrates. Through reactive ion etching, linear grooves with a trapezoidal cross-section are etched into the substrate surface, resembling conventional gratings. The etching process enables different period and depth specifications for these grooves, as well as more complex patterns such as lattices. Coherent LightSmyth Nanopattern Silicon Stamps are ideal for nanophotonics research applications in the fields of optics and photonics, biology, chemistry, nanoimprinting, and microfluidics. Note: II-VI Incorporated is now Coherent Corp. Specifications General Model Number: 1304075 Type: Nanopatterned Silicon Stamp Physical & Mechanical Properties Period (nm): 855 ±1 Groove Depth (nm): 200 ±30 Line Width (nm): 425 ±42.5 Dimensions (mm): 12.50 x 12.50 Clear Aperture CA (mm): 11.50 x 11.50 Construction: RIE Grating Length (mm): 12.50 Thickness (mm): 0.68 ±0.05 Width (mm): 12.50 Optical Properties Coating: Uncoated Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More Single Crystal Silicon Surface Quality: 60-40 (within CA) Regulatory Compliance Certificate of Conformance: View ×